1. Cleanse and dry your face.
2. Open the sachet, gently take out the mask, place on a flat surface and carefully unfold it. There are two protective layers, one on each side of the mask.
3. Remove the layer facing upwards. Place this side to your skin. Adjust the position to fit around the eyes, nose and mouth.
4. Carefully peel off the top protective layer of the mask.
5. Smooth the mask itself over the skin, minimizing air bubbles and creases between skin and the mask.
6. Leave on for at least 10-15 minutes.
7. Remove the mask by gently lifting it off your face. Massage the remaining serum into the skin until it is fully absorbed.
Do not use with peeling products or on irritated skin.
Avoid contact with the eyes.
Hyaluronic acid a substance naturally occurring in the body with an exceptional capacity to bind water. It acts as an invisible barrier and can hold up to 1000 times its own weight in water. It therefore plays an important role in keeping the skin hydrated.
Resistress, is an extract made from Sophora Japonica Flowers enriched with Quercetin, a plant polyphenol. It activates the skin's own defence system against oxidative stress and stimulates a faster regeneration of the cells in the epidermiss.
Glycerin naturally occurs in the skin and has softening and strengthening properties. The Retreat Mask formula has an exceptionally soothing, protective and moisturising effect and is therefore perfect for quickly restoring balance to stressed skin.